A Tour of the Zaera Lab
Our laboratory currently has 6 main ultrahigh vacuum (UHV) chambers with instrumentation for:
- Temperature-programmed desorption (TPD);
- X-ray photoelectron spectroscopy (XPS);
- Low-energy ion scattering spectroscopy (LEIS);
- Auger electron spectroscopy (AES);
- Reflection-absorption infrared spectroscopy (RAIRS);
- Molecular beam (MB) kinetic measurements.
We also count with a number of Fourier-transform infrared (FT-IR) absorption spectrometers for both vacuum and non-vacuum surface species characterization in transmission, single-reflection, attenuated total reflection (ATR), and diffuse-reflectance (DRIFTS) modes.
Additional facilities include:
- Batch and flow reactors for kinetic measurements of catalytic reactions;
- Gas chromatography and mass spectrometry detection;
- Reactors designed to test chemical vapor deposition (CVD) and atomic layer deposition (ALD) of thin films;
- Synthetic capabilities for the preparation of nanostructured materials;
- Personal computers, multiple PCs (DOS/Windows and Macintosh environments) for data acquisition and processing;
- Access to the computing and analytical (NMR, mass spectrometry, optical lab) facilities of the Department of Chemistry;
- Access to the electron microscopy facility;
For a more detailed description of the main facilities in our laboratory please click on the buttons below or use the dropdown menu on the top.